NANO IMPRINT LITHOGRAPHY
Obducat provides viable and cost-effective lithography and wet processing solutions that will give a competitive edge to our customers, enabling them to deliver break-through applications and achieve improved profitability and success.
Obducat’s products can be divided into two groups based on the underlying technology platform: Nanoimprint Lithography (NIL) and the Wet Processing systems.
Obducat’s products can be divided into two groups based on the underlying technology platform: Nanoimprint Lithography (NIL) and the Wet Processing systems.
NANO IMPRINT LITHOGRAPHY PRODUCTS
Eitre 3
The EITRE® 3 systems are very versatile tools for areas in solid-state lighting, micro optical and photonic components, patterned media, bio-medical and life science, lab-o-chip, MEMS/NEMS and semiconductors.
Eitre 6
The EITRE® 6 Nano Imprint Lithography (NIL) Systems provide a manual and affordable lithography solution that enable pattern replication both in the micro- and nanometer range.
Eitre 8
The EITRE® 8 Nano Imprint Lithography (NIL) Systems provide a manual and affordable lithography solution that enable pattern replication both in the micro- and nanometer range.
Sindre 600
The fully automated Sindre® imprint platform is an extension to the Obducat’s NIL product family.